| 苏瑶,贾生强,王云龙,沈阿林,谢炜.叶面阻控剂施用对轻中度镉污染麦田安全生产的影响[J].农业环境科学学报,2026,45(2):373-382. |
| 叶面阻控剂施用对轻中度镉污染麦田安全生产的影响 |
| Effects of foliar inhibitor application on safe production in mild and moderate cadmium polluted wheat fields |
| 投稿时间：2025-03-24 修订日期：2025-05-08 |
| DOI：10.11654/jaes.2025-0277 |
| 中文关键词: Cd污染土壤 叶面阻控剂 喷施时期 转运 小麦 |
| 英文关键词: Cd contaminated soil foliar inhibitor spraying period transport wheat |
| 基金项目:国家小麦产业技术体系项目（CARS-03）；桐庐县2024年受污染耕地安全利用关键技术研究与示范项目（SZQL-TL2024CS-002）；桐庐县受污染耕地安全利用和区域动态调整关键技术研究与示范项目（IICCGTL2023-057） |
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| 中文摘要: |
| 为探究叶面阻控剂施用对镉（Cd）污染农田小麦生产的影响，实现小麦安全生产，通过大田试验，分别在小麦拔节初期（T1）、抽穗初期（T2）、灌浆初期（T3）、拔节初期+抽穗初期（T4）、抽穗初期+灌浆初期（T5）和拔节初期+抽穗初期+灌浆初期（T6）喷施2种不同叶面阻控剂[分别含锌（0.4 g·L-1）、腐植酸（30 g·L-1）、水溶硅（0.1 g·L-1）和可溶性硅盐（0.1 g·L-1）、钾盐（15.0%）]，以不喷施叶面阻控剂作为对照（CK），以期筛选出适宜的阻控剂产品和最佳喷施时期。结果表明：相较于CK，喷施含锌、腐植酸和水溶性硅的叶面阻控剂（3 L·hm-2）后小麦平均增产6.1%~47.2%，增产比例由高到低依次为T6>T1>T4>T2>T5>T3，其中，T6处理小麦产量显著高于CK、T2、T3和T5处理；喷施含水溶硅和钾盐的叶面阻控剂（3 L·hm-2）较CK处理，小麦平均增产5.4%~19.9%，但各处理间无显著差异。相较于CK，T4、T5和T6处理下喷施含锌、腐植酸和水溶性硅的叶面阻控剂可通过增加小麦对土壤锌的吸收、降低小麦籽粒Cd富集系数和地上部转运系数，进而显著减少籽粒Cd含量至0.08~0.12 mg·kg-1，降Cd比例为83.3%~89.5%；T4和T6处理小麦籽粒Cd含量为0.1 mg·kg-1，达到国家小麦安全生产标准。喷施2种叶面阻控剂对土壤pH值、全Cd和有效态Cd含量影响较小。研究表明，在小麦拔节初期、抽穗初期和灌浆初期联合喷施含锌、腐植酸和水溶性硅的叶面阻控剂能有效实现小麦安全生产和增产增收。 |
| 英文摘要: |
| To investigate the impact of foliar inhibitors on the safe utilization of cadmium（Cd）contaminated soil and to achieve the safe production of wheat, a field experiment was conducted and 2 types of foliar inhibitors, containing different components such as zinc（0.4 g· L-1）, humic acid（30 g · L-1）and water-soluble silicon（0.1 g · L-1）, and water-soluble silicon（0.1 g · L-1）and potassium（15.0%） respectively, were tested at different growth stages of wheat：initial jointing stage（T1）, heading stage（T2）, grouting stage（T3）, initial jointing stage + heading stage（T4）, heading stage+grouting stage（T5）and initial jointing stage + heading stage + grouting stage（T6）. The control treatment was carried out without foliar inhibitor. The results showed：the average grain yield increase rate of wheat treated with the foliar inhibitor containing zinc, humic acid and water-soluble silicon（3 L·hm-2）was 6.1%-47.2%, and the yield increase rate was in the order of T6>T1>T4>T2>T5>T3 from high to low. Among them, the yield of wheat in treatment of T6 was significantly higher than that in CK, T2, T3 and T5. The average yield of wheat treated with foliar inhibitor containing water-soluble silicon and potassium（3 L·hm-2）was 5.4%-19.9% higher than that in CK, but there was no significant difference among different treatments. Compared with CK, T4, T5 and T6 treatment with foliar inhibitor containing zinc, humic acid and water-soluble silicon could significantly reduce the Cd content in wheat grains to 0.08-0.12 mg · kg-1 by increasing the absorption of soil zinc by wheat, reducing the Cd enrichment coefficient and transport coefficient of wheat grains, and the proportion of cadmium reduction is 83.3%-89.5%. The wheat grain Cd content of T4 and T6 treatments reached the national wheat safety production standard of 0.1 mg·kg-1. The effects of the 2 foliar inhibitors on soil pH value, total Cd and available Cd content were not significant. In conclusion, the application of foliar inhibitor containing zinc, humic acid and water-soluble silicon in the initial jointing, heading and grouting stages of wheat can effectively achieve the safe production of wheat and increase yield and income. |
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